Tohoku Univ. Technology：Optical nanoimprinting method that enables a uniform residual layer without burr generation at mold edge: T19-159
Precise manufacture of complicated structure with sparse/dense micro/nano-patterns!
Ultraviolet nanoimprint lithography (UV-NIL) have attracted attention as an industrially acceptable nanofabrication technology from views of cost and throughput; However, the use of spincoated films of photo-curable resin on substrates causes the problems of burr generation arising from mold edges and unleveled residual layers arising from site-selective differences in pattern densities of mold surfaces. The problems make subsequent lithography processes impossible. This optical nanoimprinting method consists of micro-scale laser-drilled screen printing and nano-scale molding. High-viscosity photo-curable resins with 1-300 Pa･s can be placed by screen printing using a polyimide sheet having through poles which are fabricated by laser drilling using a picosecond pulsed laser. The minimum volume of a printed droplet is 5 fL (10-15L). The resist patterns and resultant silicon patterns with 45-nm-linewidths are fabricated.
- Company：Tohoku Techno Arch Co., Ltd.
- Price：Other
